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IC工艺技术系列讲座第二讲讲座提要1. General2.0 Facilityrequirement3.0 Mask(掩膜版)PelliclePellicleprotection4.0 光刻工艺概述4.1 PrebakeandHMDStreatment4.2 ResistCoating(涂胶)4.2.1 Coater(涂胶机)SVG88004.2.3Coater(涂胶机)4.2.4 Coater(涂胶机)ResistType4.3 .1Exposure(曝光)4.3.2 Exposure(曝光)4.3.3 Exposure(曝光)Contactprint---Canon5014.3.4 Exposure(曝光)PE240ScannerCanon600Scanner4.3.5 Exposure(曝光)4.3.6 Exposure(曝光)64.4.1 Develop(显影)4.4.2Develop(显影)4.4.3 Develop(显影)4.5.1 DevelopInspection4.5.2 DevelopInspectionNanoline---forCDmeasurementHitachi8860---CDSEMLeitzMicroscopeinspectstationAutoloadUVinspectionsystem5.0 BCD正胶工艺SVG90SVG88005.1.1 PositiveResist(正胶)5.1.2 PositiveResist(正胶)5.1.4 PositiveResist(正胶)5.2 ExposePositiveResistreactionduringexposePositiveResistreactionduringexpose5.2.1 UltratechStepperUltratechStepper1100UltratechStepper1500/17005.2.2 UltratchstepperspecificationUTS---ReticleandJobfileUTS---primarylensUTSAlignmentOpticUlratechsteppersitebysitealignmentUTalignmentprocedure5.3PerkinElmeralignerPE240SpecificationPE240PE240PE---FocuswedgemaskPE---distortionPE---ProjectionopticPEMercurylampPE---AdjustableslitPEalignmentprocedure5.4.1 ResistdevelopSVG8800SVG905.4.2Resistdevelop6.Historyand未来的光刻工艺6.1 HistoryLithographiclorehasitthatthediazonaphthoquinone/novolakresist(thetermnovolakisderivedfromtheSwedishwordlak,meaninglacquerorresinandprefixedbytheLatinwordnovo,meaningnew)madetheirwayfromtheblueprintpaperindustrytothemicroelectronicthroughfamilyties:atthattimes,theofficesofAzoplate,theAmericanoutletforKalleprintingplate,waslocatedatMurrayHill,NJ,justacrossthestreetfromthefamousBellLabs.ThefatherofatechnicianatAzoplateworkedasatechnicianatBellLabs.ApparentlythefatherhadcomplainedonedayaboutthepoorresolutionqualityofthesolventdevelopedresistsystemusedattheBellLabsandthesonhadboastedthepropertiesoftheAzoplateDNQ/novolakmaterial;anyway,onedaythefathertookabottleofthematerialwithhimtotheBellLabs,andtheageoftheDNQ/novolakresistbegan. ThenewmaterialwasmarketedbyAzoplateunderthetradenameofAZphotoresist.Itwasal