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磁控溅射结合脉冲激光制备钛掺杂硅薄膜的研究（英文）.docx

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磁控溅射结合脉冲激光制备钛掺杂硅薄膜的研究（英文） ResearchonthePreparationofTitanium-dopedSiliconThinFilmsbyMagnetronSputteringCombinedwithPulsedLaser Abstract Inthisstudy,weinvestigatedthepreparationoftitanium-dopedsiliconthinfilmsusingmagnetronsputteringcombinedwithpulsedlaser.Theeffectsofthemagnetronsputteringpower,Titargetpower,andnumberoflaserpulsesonthestructuralandopticalpropertiesofthefilmswerestudied.ItwasfoundthatthecrystallinityofthefilmswasimprovedwithincreasingmagnetronsputteringpoweranddecreasingTitargetpower.Thenumberoflaserpulseshadasignificanteffectonthecrystallinityandsurfacemorphologyofthefilms.Withanincreasingnumberoflaserpulses,thesurfaceroughnessofthefilmswasincreased.Theresultsdemonstratethatmagnetronsputteringcombinedwithpulsedlasercanbeapromisingmethodforpreparingtitanium-dopedsiliconthinfilms. Introduction Asawidelyusedsemiconductormaterial,siliconhasreceivedconsiderableattentioninthedevelopmentofvariouselectronicdevicesduetoitsgoodthermalstability,highelectricalresistivityandabundantnaturalresources.Buttheperformanceofsilicon-baseddevicesislimitedbythepooropticalpropertiesofsilicon.Toimprovetheopticalpropertiesofsilicon,variouselementssuchascarbon,germaniumandtitaniumhavebeenintroducedintosiliconmatrix,amongwhich,titanium-dopedsiliconhasbeenwidelystudiedduetoitsexcellentopticalperformanceandhighstability. Magnetronsputteringisacommonlyusedmethodforthepreparationofthinfilmmaterials.Inrecentyears,pulsedlaserhasbeenintroducedtoimprovethequalityofthefilmsbymodifyingtheirmicrostructureandsurfacemorphology.Thecombinationofmagnetronsputteringandpulsedlaserhasbeenshowntobeaneffectivemethodforfabricatingthinfilmswithenhancedproperties. Inthisstudy,weinvestigatedthepreparationoftitanium-dopedsiliconthinfilmsusingmagnetronsputteringcombinedwithpulsedlaser.Theeffectsofthemagnetronsputteringpower,Titargetpower,andnumberoflaserpulsesonthestructuralandopticalpropertiesofthefilmswerestudied. Experimental Thetitanium-dopedsiliconthinfilmswerepreparedusingadualmagnetronsputterings