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基于同步辐射光刻的多层微纳结构制造(英文) Introduction: Inrecentyears,thefabricationofmicro-andnano-scalestructureshasbecomeanintegralpartofmoderntechnology.Thesestructureshavepotentialapplicationsinarangeoffields,includingphotonics,sensors,medicaldiagnosticdevices,andmicro-electricalsystems.Thesynthesisofsuchstructuresrequirestheuseofadvancedtechniques,andonesuchtechniqueissynchrotronradiationlithography. Synchrotronradiationlithographyisaversatiletechniqueusedinthesynthesisofmulti-layermicro-andnano-scalestructures.Thistechniquehasbeenknowntoenhancetheresolutionoftraditionalphotolithography,duetoitssuperioropticalpropertiesoverconventionallightsources.Synchrotronradiationlithographyusesx-raybeamsproducedbythesynchrotronradiationsourcetocreatepatternsonphotoresistmaterials.Thistechniquehasbeenusedtocreatehighaspectratiomicro-structures,aswellastosynthesizenanostructuresusingnanolithography. Fabricationofmulti-layermicro-andnano-scalestructures: Multi-layermicro-andnano-scalestructurescanbefabricatedusingsynchrotronradiationlithographybysequentiallypatterningmultiplelayersofphotoresist,followedbyetching.Themainadvantageofthistechniqueisthatitallowsforprecisioncontroloftheshapeandthicknessofeachlayerinthefinalstructure.Additionally,theuseofsynchrotronradiationlithographytocreatemulti-layerstructuresenablesthecreationofcomplexthree-dimensionalstructures,whichcanbedifficulttoproducewithothermethods. Thefabricationofmulti-layermicro-andnano-scalestructuresusingsynchrotronradiationlithographyinvolvesthefollowingsteps: 1.Thefirststepinvolvesdepositingathinlayerofphotoresistmaterialonthesubstrate.Thethicknessofthephotoresistlayershouldbedeterminedbasedonthedesiredheightofthestructure. 2.Thenextstepistopatternthefirstlayerusingsynchrotronradiationlithography.Thisinvolvesexposingthephotoresistmaterialtothesynchrotronradiationbeamthroughamaskthathasthedesiredpattern. 3.Afterpatternformation,thephotoresistmaterialisdeveloped,leavingbehindthepatternonthesubstrate. 4.Thesubstrateisthenetchedtoremov