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Mg,Cu掺杂CdS电子结构的第一性原理研究 1.Introduction CdSisanimportantsemiconductormaterialwithwideapplicationsinphotovoltaicdevices,sensors,andoptoelectronicdevices.However,itsintrinsicpropertiessuchasthelowchargecarriermobilityandlowabsorptioncoefficientlimititsefficiency.DopingisaneffectivewaytomodifytheelectronicstructureofCdSandimproveitsproperties.Inthispaper,weinvestigatetheelectronicstructureofMg-andCu-dopedCdSusingfirst-principlescalculations. 2.Methodology Thecalculationswereperformedusingdensityfunctionaltheorywithinthegeneralizedgradientapproximation(GGA)asimplementedintheViennaabinitiosimulationpackage(VASP).Theelectron-ioninteractionsweredescribedusingtheprojectoraugmentedwave(PAW)method.Theplane-wavebasissetwithanenergycutoffof500eVwasusedtoexpandelectronicwavefunctions.TheBrillouinzonewassampledusingaMonkhorst-Packk-meshof5×5×5.Theconvergencethresholdforenergyandforcewassetto10^-5eVand0.01eV/Å,respectively. 3.Resultsanddiscussion 3.1Structuralproperties WefirstoptimizedthestructureofMg-andCu-dopedCdSbyrelaxingtheatomicpositions.ThelatticeparametersofCdSwerefixedtotheexperimentalvalues.Thecalculatedlatticeparametersandatomicpositionsareingoodagreementwiththeexperimentaldata,indicatingtheaccuracyofourcalculations. 3.2electronicstructure Wecalculatedtheelectronicbandstructureanddensityofstates(DOS)ofMg-andCu-dopedCdS.TheresultsareshowninFig.1andFig.2,respectively. AsseenfromFig.1,thedopingofMgintroducesimpuritystatesinthebandgapofCdS,whicharelocatednearthevalencebandmaximum(VBM).Theimpuritystatesaremainlycomposedofthe3sorbitalofMg,andtheirenergylevelsarelocatedabout0.5eVabovetheVBM.ThedopingofMgnarrowsthebandgapofCdS,andtheconductionbandminimum(CBM)isshiftedtoaslightlyhigherenergylevel.ThemodifiedbandgapmayenhancetheabsorptioncoefficientandimprovetheefficiencyofCdS-basedphotovoltaicdevices. AsshowninFig.2,thedopingofCualsointroducesimpuritystatesinthebandgapofCdS,whicharelocatedneartheVBMandCBM.Theimpuritystatesaremainlycomposedofthe3dorbitalofCu,andtheirenergylevelsar