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H,O,N,He原子掺杂Al原子的第一性原理研究 Title:FirstPrinciplesStudyonH,O,N,andHeAtomDopinginAl Abstract: Inrecentyears,atomdopinghasemergedasaneffectivemethodformodifyingthepropertiesofmaterials.Thisstudyinvestigatestheeffectsofhydrogen(H),oxygen(O),nitrogen(N),andhelium(He)atomdopingonaluminum(Al)usingfirstprinciplescalculations.TheelectronicandstructuralpropertiesofAlarestudied,focusingonthechangesinducedbythepresenceofthesedopants.Theresultsprovideinsightsintothepotentialapplicationsofatom-dopedAlinvariousfields,includingcatalysis,energystorage,andelectronics. 1.Introduction: Atomdopingreferstointroducingforeignatomsintoahostmaterialtomodifyitsproperties.Thistechniquehasgainedsignificantattentionduetoitsabilitytotailortheelectronic,magnetic,andopticalpropertiesofmaterials.Inthisstudy,weexaminetheeffectsofH,O,N,andHeatomdopingonAlusingfirstprinciplescalculations.Thechoiceofthesedopantsisbasedontheirprevalenceinvariousindustrialandscientificapplications. 2.Methodology: Firstprinciplescalculations,basedondensityfunctionaltheory(DFT),areperformedusingappropriatesoftwarepackagessuchasVASPorQuantumEspresso.ThePerdew-Burke-Ernzerhof(PBE)exchange-correlationfunctionalisusedtodescribeelectron-electroninteractions.TheinclusionofvanderWaalsinteractions,whichcanaffecttheinteractionbetweendopantatomsandthehostlattice,isalsoconsidered.Theconvergencecriteriaforenergyandforcesaresettoareasonableleveltoensuretheaccuracyofthecalculations. 3.ElectronicProperties: TheelectronicbandstructurecalculationsofferinsightsintothechangesinducedbyH,O,N,andHedopantsintheAllattice.Thedopantsmayintroducenewenergylevelswithinthebandgapormodifyexistingones,affectingtheelectronictransportpropertiesofthematerial.Thedensityofstatesanalysishelpscharacterizetheeffectsofdopingontheelectronicstructure. 4.StructuralProperties: ThestructuralpropertiesoftheAllattice,suchaslatticeconstant,elasticconstants,andbulkmodulus,areinvestigatedwithatomdoping.Thesepropertiesdeterminethestabilityandmechanicalbehaviorofthematerial.Thes