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化学气相沉积金刚石薄膜的介电性能研究(英文) Title:StudyontheDielectricPropertiesofChemicalVaporDepositionDiamondFilms Abstract: Diamondisknownforitsoutstandingphysicalandchemicalproperties,makingitahighlydesirablematerialforvariousapplications.Chemicalvapordeposition(CVD)isawidelyusedtechniqueforthesynthesisofdiamondfilms.ThispaperaimstoinvestigatethedielectricpropertiesofCVD-growndiamondfilms.Thedielectricproperties,includingdielectricconstant,dielectricloss,andbreakdownstrength,willbeexaminedtoevaluatethepotentialofdiamondfilmsfordielectricapplications. 1.Introduction: Diamond,withitsexceptionalhardness,thermalconductivity,andwidebandgap,hasattractedtremendousinterestinthefieldofelectronics,particularlyinhigh-powerdevicesandhigh-frequencyapplications.CVDisaversatiletechniquetodepositdiamondfilmswithcontrolledproperties.Thisstudyfocusesonexploringtheelectricalpropertiesofdiamondfilmstoassesstheirdielectricsuitability. 2.CVDDiamondFilmSynthesis: TheCVDmethodinvolvesthedecompositionofhydrocarbongasesinacontrolledenvironmenttodepositdiamondfilmsonasubstrate.Variousparameterssuchastemperature,gascomposition,andpressureinfluencethepropertiesofthedepositedfilms.Thegrowthmechanismandthefactorsaffectingthequalityofdiamondfilmswillbediscussedinthissection. 3.DielectricConstantandDielectricLoss: Thedielectricconstantanddielectriclossareimportantparametersinevaluatingtheelectricalperformanceofmaterials.Themeasurementtechniquesandapparatususedtodeterminethesepropertieswillbeoutlined.Emphasiswillbeplacedondiscussingthefactorsinfluencingthedielectricpropertiesofdiamondfilms,suchasgrainboundaries,defects,andimpurities. 4.BreakdownStrength: Thebreakdownstrengthisacrucialfactorindeterminingtheelectricalrobustnessofdielectricmaterials.ThebreakdownstrengthofCVDdiamondfilmswillbeinvestigatedinthissection.Theinfluenceoffilmquality,thickness,andbiasingconditionsonthebreakdownstrengthwillbediscussed. 5.FactorsInfluencingtheDielectricProperties: Thissectionwillexplorethevariousfactorsthataffectthedielectricpr