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等离子抛光石英玻璃表面粗糙度研究.docx

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等离子抛光石英玻璃表面粗糙度研究 Title:StudyonSurfaceRoughnessofQuartzGlassPolishedbyPlasmaPolishing Abstract: Quartzglassiswidelyusedinvariousfieldsduetoitsexcellentopticalandthermalproperties.However,itssurfaceroughnessoftenaffectsitsperformanceandapplication.Inrecentyears,plasmapolishinghasemergedasapromisingtechniqueforimprovingthesurfacequalityofquartzglass.Thisstudyaimstoinvestigatetheeffectsofplasmapolishingonthesurfaceroughnessofquartzglassandexploretheoptimizationconditionsforachievinglowsurfaceroughness. Introduction: Quartzglass,alsoknownasfusedsilica,possessesexceptionaltransparency,hightemperatureresistance,andchemicalinertness.Thesepropertiesmakeitsuitableforapplicationsinoptics,electronics,andsemiconductorindustries.However,duringthefabricationprocess,surfaceimperfectionssuchasscratchesandmicroroughnesscanoccur,affectingtheoverallperformanceofquartzglasscomponents.Traditionalmechanicalpolishingtechniqueshavelimitationsinachievingultra-smoothsurfaces.Therefore,alternativemethodssuchasplasmapolishinghavegainedsignificantattention. Methodology: 1.SamplePreparation:Quartzglasssamplesarecutintoappropriateshapesandsizesfortheexperiment. 2.PlasmaPolishing:Thepreparedquartzglasssamplesaresubjectedtoplasmapolishingusingaplasmapolishingsystem.Theparameterssuchasgascomposition,pressure,power,andtimearevariedtoinvestigatetheireffectsonthesurfaceroughness. 3.SurfaceCharacterization:Thesurfaceroughnessofthepolishedquartzglasssamplesisevaluatedusingtechniquessuchasatomicforcemicroscopy(AFM),scanningelectronmicroscopy(SEM),andprofilometry.Surfaceroughnessparameters,includingRa(averageroughness),Rq(rootmeansquareroughness),andRz(maximumheightoftheprofile),aremeasuredandcompared. ResultsandDiscussion: Theresultsobtainedfromtheexperimentsdemonstratethatplasmapolishingsignificantlyreducesthesurfaceroughnessofquartzglass.Thechoiceofgascompositioninfluencesthesurfaceroughness,withcertaingasesshowingbetterperformancethanothers.Increasedpressuretendstoimprovethefinalsurfacequality,whileexce