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GaN基高压LED的制备及测试分析 Title:PreparationandTestingAnalysisofGaN-basedHigh-VoltageLED Abstract: Inrecentyears,GaN-basedhigh-voltagelight-emittingdiodes(LEDs)havegainedsignificantattentionduetotheirpotentialforenergy-efficientlightinganddisplayapplications.ThispaperpresentsacomprehensivestudyonthepreparationandtestinganalysisofGaN-basedhigh-voltageLEDs.Theaimofthisstudyistoprovideanin-depthunderstandingofthefabricationprocessandperformanceevaluationoftheseLEDs.VarioustechniquesandmethodologiesemployedinthepreparationofGaN-basedhigh-voltageLEDsarediscussed,includingepitaxialgrowth,fabricationofp-njunctions,andpackaging.Additionally,importanttestingandanalysismethodsusedforassessingtheperformanceoftheseLEDs,suchaselectricalcharacterization,lightoutputmeasurements,andreliabilitytesting,areaddressedindetail.TheresultsobtainedfromtheseanalysesprovideinsightintotheoptimizationofperformanceparametersandenhancementoftheoverallefficiencyofGaN-basedhigh-voltageLEDs. 1.Introduction 1.1Background GaN-basedLEDshaverevolutionizedthelightingindustry,offeringsuperiorenergyefficiencyandlongerlifespancomparedtotraditionallightsources.However,theefficientoperationofLEDsathighvoltagesrequirescarefuldesign,materialselection,andmanufacturingprocesses.ThisstudyfocusesspecificallyonGaN-basedhigh-voltageLEDs,whicharecapableofoperatingatgreaterthan100V. 1.2Objective TheobjectiveofthisstudyistoinvestigatethepreparationandtestinganalysisofGaN-basedhigh-voltageLEDs.Byunderstandingthefabricationprocessesandperformanceevaluationtechniques,researcherscanoptimizetheperformanceparametersandenhancetheefficiencyoftheseLEDs. 2.FabricationofGaN-basedHigh-VoltageLEDs 2.1EpitaxialGrowth Theepitaxialgrowthofhigh-qualityGaNlayersisacriticalstepinthefabricationofGaN-basedLEDs.Variousgrowthtechniques,suchasmetalorganicchemicalvapordeposition(MOCVD),molecularbeamepitaxy(MBE),andhydridevaporphaseepitaxy(HVPE),arediscussedinthissection.Theinfluenceofgrowthparametersonthecrystalquality,thickness,andconductivityofGaNlaye