ZnO：Al透明导电薄膜的磁控溅射制备及其特性研究的中期报告.docx

ZnO：Al透明导电薄膜的磁控溅射制备及其特性研究的中期报告
摘要：
本文主要介绍ZnO：Al透明导电薄膜的磁控溅射制备方法及其特性研究的中期报告。通过改变工艺参数，包括气体流量、沉积时间和沉积温度等，制备了不同厚度的ZnO：Al薄膜。通过X射线衍射仪、扫描电子显微镜和原子力显微镜等测试手段对薄膜的结晶性、表面形貌和光学特性进行了分析研究。结果表明，随着沉积时间的增加，薄膜的厚度和晶粒尺寸逐渐增大；而随着沉积温度的升高，薄膜的透明度和导电性能也逐渐提高。
关键词：ZnO：Al薄膜；磁控溅射；结晶性；表面形貌；光学特性
Abstract:
Thispapermainlyintroducesthemid-termreportonthepreparationmethodandcharacteristicsofZnO:Altransparentconductivefilmbymagnetronsputtering.Bychangingtheprocessparameters,includinggasflowrate,depositiontimeanddepositiontemperature,ZnO:Alfilmsofdifferentthicknesseswereprepared.Thecrystallinity,surfacemorphologyandopticalpropertiesofthefilmswereanalyzedandstudiedbyX-raydiffraction,scanningelectronmicroscopyandatomicforcemicroscopy.Theresultsshowthatwiththeincreaseofdepositiontime,thethicknessandgrainsizeofthefilmgraduallyincrease;andwiththeincreaseofdepositiontemperature,thetransmittanceandconductivityofthefilmalsograduallyimprove.
Keywords:ZnO:Alfilm;magnetronsputtering;crystallinity;surfacemorphology;opticalproperties